Aluminium nitride

Aluminium nitride
Names
IUPAC name
Aluminium nitride
Other names
AlN
Identifiers
3D model (JSmol)
ChEBI
ChemSpider
ECHA InfoCard 100.041.931
EC Number
  • 246-140-8
13611
RTECS number
  • BD1055000
UNII
  • InChI=1S/Al.N Y
    Key: PIGFYZPCRLYGLF-UHFFFAOYSA-N Y
  • InChI=1/Al.N/rAlN/c1-2
    Key: PIGFYZPCRLYGLF-PXKYIXAJAH
  • [AlH2-]1[N+]47[AlH-]2[N+][AlH-]3[N+]8([AlH2-][NH+]([AlH2-]4)[AlH2-]6)[AlH-]4[N+][AlH-]5[N+]6([AlH2-]6)[Al-]78[N+]78[AlH-]([NH+]69)[NH+]5[AlH2-][NH+]4[AlH-]7[NH+]3[AlH2-][NH+]2[AlH-]8[NH+]1[AlH2-]9
  • [AlH2-]1[NH+]([AlH2-]6)[AlH2-][NH+]7[AlH-]2[N+][Al-]3([N+][AlH-]9[N+]5)[N+]18[Al-]45[N+][AlH-]5[NH+]6[Al-]78[N+]78[AlH2-][NH+]5[AlH2-][N+]4([AlH2-][NH+]9[AlH2-]4)[AlH-]7[N+]34[AlH2-][NH+]2[AlH2-]8
Properties
AlN
Molar mass 40.989 g/mol
Appearance white to pale-yellow solid
Density 3.255 g/cm3
Melting point 2,500 °C (4,530 °F; 2,770 K)
hydrolyses (powder), insoluble (monocrystalline)
Solubility insoluble, subject of hydrolysis in water solutions of bases and acids
Band gap 6.015 eV (300 K, direct)
Electron mobility ~300 cm2/(V·s)
Thermal conductivity 321 W/(m·K)
2.048(300 k, λ = 633 nm)
Structure
Wurtzite (Atmospheric)
C6v4-P63mc, No. 186, hP4
a = 0.31117 nm , c = 0.49788 nm
2
Tetrahedral
Structure
Rocksalt (High-pressure)
, No. 225, cF8
a = 0.3938 nm
4
Thermochemistry
30.1 J/(mol·K)
20.2 J/(mol·K)
−318.0 kJ/mol
−287.0 kJ/mol
Hazards
GHS labelling:
Warning
H315, H319, H335, H373, H411
P260, P264, P271, P280, P301+P330+P331, P302+P352, P303+P361+P353, P304+P340, P305+P351+P338, P310, P312, P321, P332+P313, P337+P313, P362, P363, P403+P233, P405, P501
Preview warning: Omit Rules: keep P260, omit P261
NFPA 704 (fire diamond)
1
0
0
Except where otherwise noted, data are given for materials in their standard state (at 25 °C [77 °F], 100 kPa).
Y verify (what is YN ?)
Infobox references

Aluminium nitride (AlN) is a solid nitride of aluminium, which was first synthesized in 1862 by F. Briegleb and A. Geuther.

AlN is a wide-bandgap semiconductor composed of aluminium and nitrogen. It crystallizes predominantly in the wurtzite structure and exhibits a direct band gap of approximately 6 eV at room temperature The exceptionally wide bandgap enables applications in deep-ultraviolet optoelectronics, while the material's thermal conductivity 321 W/(m·K), and strong polarization effects make it an important buffer and template material for III-nitride quantum heterostructures used in high-power and high-frequency electronic devices.