Aluminium nitride
| Names | |
|---|---|
| IUPAC name
Aluminium nitride
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| Other names
AlN
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| Identifiers | |
3D model (JSmol)
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| ChEBI | |
| ChemSpider | |
| ECHA InfoCard | 100.041.931 |
| EC Number |
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| 13611 | |
PubChem CID
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| RTECS number |
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| UNII | |
CompTox Dashboard (EPA)
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| Properties | |
| AlN | |
| Molar mass | 40.989 g/mol |
| Appearance | white to pale-yellow solid |
| Density | 3.255 g/cm3 |
| Melting point | 2,500 °C (4,530 °F; 2,770 K) |
| hydrolyses (powder), insoluble (monocrystalline) | |
| Solubility | insoluble, subject of hydrolysis in water solutions of bases and acids |
| Band gap | 6.015 eV (300 K, direct) |
| Electron mobility | ~300 cm2/(V·s) |
| Thermal conductivity | 321 W/(m·K) |
Refractive index (nD)
|
2.048(300 k, λ = 633 nm) |
| Structure | |
| Wurtzite (Atmospheric) | |
| C6v4-P63mc, No. 186, hP4 | |
a = 0.31117 nm , c = 0.49788 nm
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Formula units (Z)
|
2 |
| Tetrahedral | |
| Structure | |
| Rocksalt (High-pressure) | |
| , No. 225, cF8 | |
a = 0.3938 nm
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Formula units (Z)
|
4 |
| Thermochemistry | |
Heat capacity (C)
|
30.1 J/(mol·K) |
Std molar
entropy (S⦵298) |
20.2 J/(mol·K) |
Std enthalpy of
formation (ΔfH⦵298) |
−318.0 kJ/mol |
Gibbs free energy (ΔfG⦵)
|
−287.0 kJ/mol |
| Hazards | |
| GHS labelling: | |
| Warning | |
| H315, H319, H335, H373, H411 | |
| P260, P264, P271, P280, P301+P330+P331, P302+P352, P303+P361+P353, P304+P340, P305+P351+P338, P310, P312, P321, P332+P313, P337+P313, P362, P363, P403+P233, P405, P501 Preview warning: Omit Rules: keep P260, omit P261
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| NFPA 704 (fire diamond) | |
Except where otherwise noted, data are given for materials in their standard state (at 25 °C [77 °F], 100 kPa).
Infobox references
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Aluminium nitride (AlN) is a solid nitride of aluminium, which was first synthesized in 1862 by F. Briegleb and A. Geuther.
AlN is a wide-bandgap semiconductor composed of aluminium and nitrogen. It crystallizes predominantly in the wurtzite structure and exhibits a direct band gap of approximately 6 eV at room temperature The exceptionally wide bandgap enables applications in deep-ultraviolet optoelectronics, while the material's thermal conductivity 321 W/(m·K), and strong polarization effects make it an important buffer and template material for III-nitride quantum heterostructures used in high-power and high-frequency electronic devices.